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QUARTZ GLASS

QUARTZ GLASS INTRODUCTION
The production method of fused quartz glass can be: electrically fused, flame fused, plasma fused and electric-arc fused. The raw material can be natural quartz sand SiO2 and synthetic chemical-silicon tetrachloride(SiCl4). The combination of production methods and raw material composes the main 6 types of our quartz glass: EN (electrically fused natural quartz) series; FN (flame fused natural quartz) series; PN (plasma fused natural quartz) series; FS (flame fused synthetic quartz) series; PS (plasma fused synthetic quartz) series; AN (electric-arc fused natural quartz) series.

Electrically Fused Quartz Glass
Electric fusion is the most commonly used melting process for manufacturing quartz glass. This process uses resistance Heaters to melt natural quartz sand into quartz glass tube, rod, blocks etc.. There are two methods of electric fusion, continous fusion and batch fusion. In the continous process, quartz sand is continuously poured into the upper part of tungsten crucible surrounded by electric Heaters elements. The inside crucible is maintained in a neutral or slightly reduced atmosphere that keeps silica from reacting with the refractory metal while the silica is melted inside. The melted quartz exits at the forming part at the bottom of crucible which is shaped into tube, rod and so on. The OH can be reduced by annealing. In the batch fusion process, several tons of raw material are placed inside a refractory vacuum chamber containing graphite Heaters elements to produce tube, rod and so on. The OH is usually below 2ppm. The low OH makes electrically fused quartz glass has high infrared transmission. The electrically fused quartz glass usually has certain bubble and drawing line on glass surface.

Flame Fused Quartz Glass
Flame fusion is a 2-step process. The first process is the natural quartz sand or synthetic SiC14 is melted in hydrogen/oxygen (H2/O2) flame into a solid round ingot. The second process is to further shape the ingot into various shape and dimension. Flame fused quartz glass contains a adundant amount of hydroxyl (OH) as a result of the direct contact between the H2/O2 and the silica raw material. This OH content can not be reduced by annealing and its presence lowers the viscosity and infrared transmission. The flame fused quartz has no drawing line and very low bubble content.

Plasma Fused Quartz Glass
Plasma fusion is a 2-step process. The first process is the natural quartz sand or synthetic SiCl4 is melted in plasma flame into a solid round ingot. The second process is to further shape the ingot into various shape and dimension. Plasma fused quartz has low OH usually below 5ppm, so it has good infrared transmission. The plasma fused quartz has very low bubble content and has no drawing line.
Electric-arc Fused Opaque Crucible
Electric-arc fusion is the commonly used process for manufacturing crucible which is used to grow monocrystalline silicon ingot.

QUARTZ GLASS TYPE

type

main application

characteristics

Standard Quartz

standard quartz

EN07

EN07EB OH ≤5ppm

industrial standard quartz, used in many industries such as semiconductor, high quality lamps and other hi-temperature fields

Lamps Quartz

standard EN07

EN07EB OH ≤5ppm

quality high pressure mercury lamps, metal halide lamps, medium pressure ozone producing UV lamps

see above

metal halide lamps, xenon flash lamps, laser flash lamps, medium preEN07SB OH≤1ppmssure ozone producing UV lamps, sleeve of medium pressure ozone producing UV lamps

Low cost EN09

EN09UB OH≤150ppm

sleeve of low pressure ozone free UV lamps, thermo-cou ple, low cost halogen bulbs, exhaust tube of low pressure lamps

electrically fused clear quartz using slightly lower purity quartz sand model N09 of SiO2 >99.95% as raw material, it has good dimensional tolerance, good thermal and mechanical properties, has certain air line and bubble content, available in tube, rod and plate

EN09UB OH≤15ppm

halogen bulbs, high pressure mercury lamps, exhaust tube of medium pressure and high pressure lamps, laborotary, chemical industries and other fields where purity is not critical

Low alkaline PN05

PN05 OH≤5ppm

lamps for critical application, for example UHP-lamps for digital projection

plasma fused clear quartz using specially purified quartz crystal sand model N05 with SiO2>99.995% as raw material. The K+Li+Na is reduced to 0.5 ppm. It is drawn without the use of mandrel and die, has very good homogeneity and very low bubble content

cerium (Ce) doped

EN09Ce NBOH
≤70ppm UV stop halogen bulbs, sleeve of metal halide lamps and HID automobile lamps, low cost UV stop application
electrically fused cerium doped quartz is known as UV stop or UV cut quartz, it blocks UV radiation almost completely and has very high transmission in visible light region, to dope N09 material and N07 material, we get EN09Ce and EN07Ce respectively, except its special optical properties, it has the same properties as its original clear quartz, available in tube, rod and plate

EN09Ce EB OH
≤20ppm quality UV stop halogen bulbs

EN07Ce EB OH
≤5ppm medium pressure, high pressure UV stop lamps

EN07Ce SB OH
≤lppm medium pressure, high pressure UV stop lamps

PN08Ce OH
≤5ppm quality laser flash lamps
plasma fused cerium doped quartz glass, is blocking UV radiation almost completely, it is drawn without the use of mandrel and die, therefore free from drawing line, it has very high homogeneity and very low bubble content, available in tube and plate

titanium (Ti) doped

EN09TiNB OH≤15ppm

Low pressure ozone free UV lamps

electrically fused titanium. doped quartz is known as ozone free quartz. It has cut off at ozone producing line of wavelength 220nm. We dope material N09 and N07 to get doped quartz glass EN09Ti and EN07Ti respectively. Except its special optical properties, it has the same dimensional, thermal, mechanical properties as its original clear quartz. Available in tube, rod, ingot and plate.

EN07TiEB OH≤5ppm

medium pressure, high pressure ozone free UV lamps such as ozone free reprographic lamps, xenon flash lamps

EN07TiSB OH≤1ppm

quality medium pressure, high pressure ozone free UV lamps, such as ozone free reprographic lamps, xenon flash lamps, sleeve of medium pressure UV lamps.

PN08Ti OH≤5ppm

quality laser flash lamps, quality xenon flash lamps

plasma fused titanium doped quartz glass,has cut off at ozone producing line of wavelength 220 nm,it is drawn without the use of mandrel and die, free from drawing line, it has high homogeneity and very low bubble content, avaiable in tube and plate.

Semiconductor & Optical Quartz

EN07EB

OH≤5ppm

the tube is used in semiconductor diffusion, oxidation and LPVCD process, the rod is used in silicon wafer carner, the ingot is used to be made into plate & flange in semiconductor and optics

see standard quartz

FN08

OH≤175ppm

handle rod & tube of fiber optics, low cost semiconductor, laboratory quart ware,insulation, aerospace and so on, can not be used in infrared

flame fused clear quartz glass, using quartz sand model N08 with SiO2>99.98% as raw material. The purity of N08 is in the middle of N07&N09. It has very low bubble and no drawing line. Available in tube, rod, ingot, plate, wool, yarn, fabrics

PN08

OH≤5ppm

infrared application, handle rod & tube of fiber optics

plasma fused clear quartz glass, using quartz sand model N08 with SiO2>99.98% as raw material, has very low bubble, no drawing line and low OH, available in tube, rod, ingot and plate.

FS03

OH≤175ppm

critical semiconductor application. optics, can not be used in infrared.

ultra high purity synthetic flame fused clear quartz glass. It uses synthetic chemical SiCl₄ with SiO2> 99.9995% as raw material. Has super high purity and excellent visual of nearly no bubble. Available in tube, rod, ingot, plate

PS03

OH≤5ppm

critical semiconductor application, infrared application, optics, deep UV application

ultra high purity synthetic plasma fused clear quartz glass. It uses synthetic chemical SiCl₄ with SiO2>99.9995% as raw material. Has super high purity and low OH, excellent visual of nearly no bubble. Available in tube, rod, ingot, plate

Fiber Optics Quartz

low alkaline PN05

PN05 OH≤5ppm

substrate tube for optical preform

see lamps quartz PN05

Quartz Crucible for Silicon Growing

AN07 OH≤50ppm

monocrystalline silicon ingot growing used for solar cell wafer

electric-arc fused quartz crucible, it has clear inner surface and sandy opaque outer surface, using quartz sand model N07 of SiO2>99.99% as raw material. Available in 12", 14", 16" , 18", 20", 22".

QUARTZ GLASS PROPERTY

Elements

Al

Fe

Ca

Mg

Li

K

Na

Ti

Component

Clear Quartz Tube, Dehydroxyl Clear Quartz Tube, Low Hydroxyl Clear Quartz Tube

23.2

4.8

3.1

2.5

2.0

504

6.1

-

UV- block Quartz Tube, Dehydroxyl UV-Block Quartz Tube, Low Hydroxyl UV- Block Quartz Tube

22.70

0.51

0.63

-

4.27

0.69

2.4

-

High Ozone Clear Quartz Tube

16.20

0.23

0.40

-

0.90

0.60

0.90

-

Property
Typical values Property Typical Values

Softening Point

1680℃

Cofficient of Thermal Expansion
( 20 - 320 ℃)

5.7×10^{^-7}cm / cm.℃

Annealing Point

1210℃

Thermal Conductivity (20℃ )

1.4 W / m.℃

Strain Point

1120℃

Specific Heat (20℃ )

670 J / Kg.℃

Density

2.2g/cm³

Electrical Resistivity (350℃ )

7×10^⁷ohm.cm

Hardness

5.5-6.5Mohs'

Dielectric Constant

3.75

Tensile Strength

4.8×10^⁷N/m²

Dielectric Strength

5×10^⁷V/m

Compressive Strength

1.1×10^⁹N/m²

-

-

Transmittance rate:(Tested at 1.0 mm thickness)

190

253.7

312

312 - 800

Clear Quartz Tube

40

87

91

91-92

Low Hydroxyl Clear Quartz Tube

45

87

91

91-92

Dehydroxyl Clear Quartz Tube

63

88

91

91-92

High Ozone Clear Quartz Tube

68

89

91

91-92

220

253.7

320

320 - 800

416 - 800

UV-Block Quartz Tube

0

<20

0

90

Ozone free Quartz Tube

0

>86

91

90

Quartz Tube Transmittance curve